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↩️ LithoWar @lithos_graphein
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SemiAnalysis
High-NA is Here (for R&D), EUV Cost, Pattern Shaping Gaining Share, 6x12" Mask, Metal Oxide & Dry Resist, Hyper-NASPIE Advanced Litho & Patterning 2025 round-up. Guest contributor, with Dylan Patel and Jeff Koch. Paid post.Illustration: a cleanroom tech is handed the keys to an ASML High-NA scanner, car-dealership style
ChinaTalk
Lithography — New Controls at the Tip of the Chip-War SpearMore export controls on ASML are coming. How will China respond?Render of the EUV light path bouncing through a scanner's mirror optics
SemiAnalysis
ASML Dilemma: High-NA EUV is Worse vs Low-NA EUV Multi-PatterningCost model for low- and high-NA EUV. Co-author, with Dylan Patel and Jeff Koch. Paid post.ASML roadmap slide: EUV 0.55 NA (High-NA) for high-volume manufacturing in 2025-2026
ChinaTalk
Litho World & Commerce: Lost in Translation?How lithography really works, and where export rules and lithographers talked past each other.Cutaway of an ASML TWINSCAN immersion scanner
 
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